The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Jul. 15, 1998
Applicant:
Inventor:
Shigeru Yamamoto, Tokyo, JP;
Assignee:
ODP Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356371 ; 3562372 ; 356446 ;
Abstract
The present invention provides an apparatus and associated method of detecting pattern unevenness in the surface of an object. The apparatus includes a light source for irradiating surfaces of an object and a line sensor camera for detecting unevenness in the surfaces. The method comprises the steps of irradiating a light onto a surface having a pattern formed on the surface thereof, and observing the scattered light from the pattern edge portions, thereby inspecting pattern unevenness by way of the line sensor camera.