The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 1999

Filed:

May. 06, 1999
Applicant:
Inventor:

Liang-Choo Hsia, Hsinchu Hsien, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257372 ; 257369 ; 257372 ; 326 83 ; 326 15 ; 326112 ; 326119 ; 326121 ; 327310 ; 327313 ; 327576 ;
Abstract

A circuit structure which avoids a latchup effect. An N-well is formed in a P-type substrate. An N-type contact is formed in the N-well. A PMOS is located on the N-well. A gate of the PMOS connects to an input terminal and a source region of the PMOS connects to a voltage source. A first NMOS and a second NMOS are located on the P-type substrate. A gate of the first NMOS connects to the input terminal, a source region of the first NMOS connects to a ground terminal, and a drain region of the first NMOS connects to an output terminal and a drain region of the PMOS. A gate of the second NMOS connects to the output terminal, a source region of the second NMOS connects to a voltage source, and a drain region of the second NMOS connects to the N-type contact.


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