The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Jan. 04, 1999
John L Nistler, Martindale, TX (US);
Charles E May, Gresham, OR (US);
Kenneth J Morrissey, Austin, TX (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A semiconductor wafer incorporating process control monitors and a method of incorporating the same are provided. In one aspect, the semiconductor wafer has a plurality of fields formed in a pattern thereon that is subdivided into n zones and has a center point. The semiconductor wafer is provided with a plurality of integrated circuits each of which is positioned in one of the plurality of fields. The semiconductor wafer also includes a plurality of diagnostic integrated circuits dispersed in a pattern. The pattern is such that each of the plurality of diagnostic integrated circuits is positioned in one of the plurality fields, one of the plurality of diagnostic integrated circuits is positioned in each of the n zones, and a circle of radius R from the center point will intersect at least one of the plurality of diagnostic integrated circuits where R is greater than or equal to the distance between the center point and the innermost of the plurality of diagnostic integrated circuits and less than or equal to the distance between the center point and the outermost of the plurality of diagnostic integrated circuits.