The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Apr. 04, 1997
Applicant:
Inventors:
Deborah D Chung, Amherst, NY (US);
Weiming Lu, Buffalo, NY (US);
Assignee:
Research Foundation of State University of New York at Buffalo, Amherst, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J / ; D01F / ;
U.S. Cl.
CPC ...
502416 ; 502424 ; 502427 ; 502420 ; 502430 ; 502432 ; 502433 ; 502434 ; 502436 ; 4234476 ; 4234477 ;
Abstract
This invention relates to a mesoporous carbon material in the form of filaments having a high surface area. A process is also provided to produce mesoporous carbon material of high surface area. The process comprises drying a carbon material, surface oxidizing the dried material, stabilizing the surface oxidized material, and activating the stabilized material to produce a highly activated, mesoporous material.
Chung, Deborah. (1999). Mesoporous activated carbon filaments (U.S. Patent No. 5990041). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5990041
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile