The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Oct. 30, 1997
Applicant:
Inventors:
Samuel J Laube, Monroe, OH (US);
Andrey A Voevodin, Dayton, OH (US);
Jeffrey S Zabinski, Dayton, OH (US);
Steven R LeClair, Spring Valley, OH (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429803 ; 20429801 ; 20429802 ; 36446826 ; 427553 ; 427554 ; 118620 ; 118641 ;
Abstract
Process control for generating graded multilayer films repetitively and consistently using both pulsed laser sputtering and magnetron sputtering deposition techniques. The invention includes an apparatus which allows for set up of an ultrahigh vacuum in a vacuum chamber automatically, and then execution of a computer algorithm or 'recipe' to generate desired films. Software operates and controls the apparatus and executes commands which control digital and analog signals which control instruments.