The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Sep. 10, 1997
Applicant:
Inventors:
Jiansheng Tang, Naperville, IL (US);
Jeffrey R Cramm, Batavia, IL (US);
Michael R St John, Chicago, IL (US);
Laura M Sherman, Naperville, IL (US);
Assignee:
Nalco Chemical Company, Naperville, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
D21F / ; D21C / ;
U.S. Cl.
CPC ...
162191 ; 162199 ; 162D / ;
Abstract
A method is disclosed for controlling anionic trash and pitch deposition and treating coated broke which comprises the step of adding a polyammonium quaternary to a pulp and papermaking system. The polyammonium quaternary, which may be either branched or crosslinked, comprises at least one cationic monomer, preferably diallyldimethylammonium chloride, and at least one branching or crosslinking monomer, preferably N,N,N-triallylamine or N,N,N-triallylamine hydrochloride.