The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Dec. 22, 1997
Applicant:
Inventors:
James F Dormer, Limekiln, PA (US);
John W Osenbach, Kutztown, PA (US);
Assignee:
Lucent Technologies, Inc., Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C / ; C03C / ; B08B / ;
U.S. Cl.
CPC ...
134-2 ; 134-13 ; 134-3 ;
Abstract
The invention is a method for removing organic and other contaminants, such as photo-resist, from semi-conductor dies and micro-lenses by placing the dies in a solution of two parts ethylene, diamine tetra-acetic-acid (EDTA) to one part peroxide at a temperature of between 30.degree. and 55.degree. C., and preferably between 40.degree. and 44.degree. C., for a period of 1-30 minutes, and preferably between 2 and 10 minutes.