The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1999
Filed:
Jan. 06, 1998
Applicant:
Inventors:
Doyle E Bennett, Santa Clara, CA (US);
Thomas H Osterheld, Mountain View, CA (US);
Fred C Redeker, Fremont, CA (US);
Ginetto Addiego, Berkeley, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D / ;
U.S. Cl.
CPC ...
451527 ; 451529 ; 451550 ;
Abstract
A polishing pad for a chemical mechanical polishing apparatus. The polishing pad includes a plurality of concentric circular grooves. The polishing pad may include multiple regions with grooves of different widths and spacings.
Bennett, Doyle. (1999). Polishing pad having a grooved pattern for use in a chemical mechanical (U.S. Patent No. 5984769). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5984769
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile