The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1999
Filed:
Nov. 06, 1997
David L Patton, Webster, NY (US);
Anne E Bohan, Pittsford, NY (US);
Kevin M O'Connor, Webster, NY (US);
Ralph L Piccinino, Jr, Rush, NY (US);
Gordon F Breese, Canandaigua, NY (US);
Ramasubramaniam Hanumanthu, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
The present invention relates to a method and apparatus of applying a solution of a predetermined viscosity to photosensitive material to form a protective coating on the photosensitive material. The method and apparatus can be used in a photographic processing device, and the apparatus can be built into an existing or new photographic processor or added on as an accessory. The method and apparatus is utilized to apply a viscous solution to at least one surface of processed photosensitize materials prior to drying in a manner that allows the solution to be uniformly applied to the at least one surface at a specific layer thickness. The viscous solution after drying functions as a protective coating which can protect the processed photosensitize material against scratches and moisture. The apparatus includes a control mechanism which controls the thickness, uniformity and laydown amount of the applied viscous solution so as to insure that a uniform coating that provides protection to the entire surface of the processed photosensitize material is provided.