The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1999
Filed:
Jan. 23, 1998
Applicant:
Inventor:
Jung-Ho Park, Changwon-si, KR;
Assignee:
Samsung Aerospace Industries, Ltd., Changwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
396443 ; 396466 ; 396489 ; 396536 ; 396207 ;
Abstract
An apparatus and a method for preventing the deviation of a focal plane shutter are disclosed. The apparatus has a back cover switch, a control unit and a shutter driver. The apparatus and method prevents the deviation of the focal plane shutter blade by opening the focal plane shutter when a back cover opens. The focal plane shutter is restored to an initial focal plane shutter state after the back cover is closed.
Park, Jung-Ho. (1999). Method and apparatus for preventing the deviation of a focal plane (U.S. Patent No. 5984537). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5984537
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile