The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 1999

Filed:

Sep. 15, 1998
Applicant:
Inventors:

Shinji Okuda, Takarazuka, JP;

Yasuyuki Yoshimoto, Ibaraki, JP;

Masaharu Takada, Ibaraki, JP;

Assignees:

Sunstar Engineering, Inc., Osaka, JP;

Uni-Sunstar B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01F / ;
U.S. Cl.
CPC ...
261 28 ; 261 30 ; 261D / ;
Abstract

Low-pressure gas is mixed in a viscous material. The flow of the gas can be easily controlled so that the dispersion of the mixing ratio of the viscous material to the gas may be confined within a small tolerance and fine bubbles may be uniformly distributed in the interior of the viscous material. The gas is mixed in the viscous material by a first pump, from which a mixture of the gas and the viscous material is delivered. Pressure is applied to the mixture by a second pump. The gas is distributed in the interior of the viscous material by allowing the mixture under pressure to pass through a conduit assembly. The viscous material is foamed when the mixture is discharged from a nozzle through a discharge pipe.


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