The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 16, 1999

Filed:

Aug. 26, 1998
Applicant:
Inventors:

Oh Eui Yeol, Miyagi-ken, JP;

Kenichi Mitsumori, Miyagi-ken, JP;

Satoshi Miyazawa, Miyagi-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
1341021 ; 134902 ;
Abstract

An aqueous oxidizing acidic cleaning solution or an aqueous oxidizing alkaline cleaning solution is produced by mixing an acidic or alkaline solution with ozone water. An aqueous reducing acidic cleaning solution or an aqueous reducing alkaline cleaning solution is produced by mixing an acidic or alkaline solution with hydrogen water. Each of these aqueous cleaning solutions has effective cleaning power and the ORP and pH values thereof are separately controlled. Therefore, by selecting an appropriate aqueous cleaning solution according to the types of contaminants adhering to subjects during each manufacturing step, a plurality of types of contaminants can be removed by washing with one type of aqueous cleaning solution.


Find Patent Forward Citations

Yeol, Oh. (1999). Cleaning method and apparatus for the same (U.S. Patent No. 5983909). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5983909

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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