The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1999
Filed:
Sep. 02, 1997
Hiroaki Yamada, Tokyo, JP;
Toshiyuki Ohta, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
In order to simulate, using a computer, a profile of sputter deposition on a contact hole formed on a semiconductor wafer, a plurality of trajectories of particles emitted from a sputter target are calculated. One of the trajectories is directed to a first coordinate point which is included in the profile of sputter deposition and with which an amount of sputter deposition is calculated. Thereafter, a plurality of shadow judgment planes are successively defined with respect to all coordinate points, after which a check is made to determine if the above mentioned one of the plurality of trajectories crosses each of said plurality of shadow judgment planes.