The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1999
Filed:
Aug. 13, 1996
Applicant:
Inventor:
Masaya Uematsu, Kanagawa, JP;
Assignee:
Sony Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 67 ; 355 53 ; 355 47 ;
Abstract
A process of forming a pattern on a substrate by irradiating light for exposure from a light source to a mask to transfer the pattern of this mask onto the substrate, wherein, before forming the intended final pattern on the substrate, exposure is carried out with an inspection pattern to a diagnostic region in which the final pattern is not to be formed, the distribution of the intensity of light irradiated to the diagnostic region is found, and at least the secondary peak of this distribution of the light intensity is observed, whereby the light source conditions are optimized and the optimized condition light source is used for forming the pattern.