Capacitively coupled rf-plasma reactor

Abstract

A capacitively coupled Rf plasma reactor and method in which first and second extended electrode arrangements are mutually and substantially constantly spaced and substantially enclose a plasma reaction volume within a reactor chamber. The first of the electrode arrangements is subdivided into electrically mutually isolated subelectrodes, and the second is a substrate carrier electrode for an extended substrate to be surface treated in the reactor. A first group of the subelectrodes is connected to a common first electric input, and a second group of the subelectrodes is commonly connected to a second electric input. The first and said second electric inputs being independent. Only one Rf signal generator providing an electric output is connected to both the first and second electric inputs via respective signal adjusting units to control ion bombardment on and along the flat substrate. Slits can be formed between subelectrodes of the first electrode arrangement with a width smaller than a dark space distance of a plasma generated in the reaction volume. A gas feed arrangement communicating with the bottom of the slits applies a gas between said subelectrodes defining said slits and into said reaction volume.