The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 1999

Filed:

Dec. 18, 1998
Applicant:
Inventors:

Susumu Takagi, Fukui, JP;

Yutaka Matsui, Fukui, JP;

Assignee:

Seiren Co., Ltd., Fukui, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D03D / ;
U.S. Cl.
CPC ...
442203 ; 1394 / ; 2901 ;
Abstract

A fabric is provided which exhibits a high dust collecting efficiency and which is superior in both waterproofness and abrasion resistance, and which is especially suitable for us in dust proof and/or waterproof clothes. The fabric is a plain weave fabric of synthetic filaments, wherein warp yarns occupy 60% to 90% of the fabric surface, a percent (%) overlap of the width (L2+L3) of overlapped portions of adjacent warp yarns relative to the width (L1) of an overlapped portion of adjacent warp yarns in a section of the fabric, i.e., ((L2+L3)/L1).times.100 is in the range of 35% to 60%, and weft yarns of the fabric are located inside the warps in the thickness direction of the fabric.


Find Patent Forward Citations

Loading…