The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 1999

Filed:

Oct. 21, 1997
Applicant:
Inventors:

Jae Chang Jung, Kyoungki-do, KR;

Cheol Kyu Bok, Kyoungki-do, KR;

Hyung Gi Kim, Kyoungki-do, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; C08L / ;
U.S. Cl.
CPC ...
4302701 ; 430910 ; 525205 ; 525221 ; 525222 ;
Abstract

A copolymer useful as a photoresist resin for submicrolithography, comprising glutarimide derivatives and acrylic acid derivatives as shown in Formula I and a photoresist composition comprising the same. ##STR1## wherein, R.sub.1 is a straight or branched alkyl group containing 0-30 carbon atoms; R.sub.2 and R.sub.3 independently represent straight or branched alkoxy or cycloalkoxy groups containing 1-15 substituted or non-substituted carbon atoms; R.sub.4 and R.sub.5 independently represent hydrogen or an alkyl group; and p, q and r, which may be the same or different, each is a polymerization ratio; p ranges from 10 to 90, q ranges from 10 to 90 and r ranges from 0 to 50.


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