The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1999
Filed:
Jun. 03, 1997
Applicant:
Inventor:
Yoichi Tomo, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
4302701 ; 430170 ;
Abstract
A photosensitive composition is provided which prevents deactivation of photosensitive compounds contained therein to provide accurate photoresist pattern shapes. The photosensitive compositions include a photosensitive acid generator, a polyhydroxy-functional resin component and an aliphatic amine. In a preferred embodiment, the photosensitive compositions also may include a bridging agent. The photosensitive compositions preferably contain the aliphatic amine(s) in an amount of from about 0.01% to about 1.0% by weight, based upon the weight of the overall photosensitive composition.