The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1999
Filed:
Feb. 17, 1998
Merrilou George, Jericho, VT (US);
Timothy E Neary, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for repairing a defect in an opaque layer of a photomask by applying a photoresist layer over the opaque layer and then removing the photoresist over the defect to reveal the defect which is repaired by a wet etch. The repair procedure of the present invention is 'self-aligning' in that the portion of the photoresist layer covering the defect, prior to being removed, extends to the edges of the defect, so that only this portion of the photoresist layer is removed to reveal only the defect in the opaque layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile