The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 1999

Filed:

Feb. 23, 1998
Applicant:
Inventors:

Shojiro Kuwahara, Kanagawa-ken, JP;

Yasushi Higuchi, Kanagawa-ken, JP;

Shinichi Hieda, Kanagawa-ken, JP;

Masahiro Kurokawa, Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C / ;
U.S. Cl.
CPC ...
264 3713 ; 264 3726 ; 264101 ; 2642096 ; 26421124 ; 26433115 ; 26433118 ; 525 54 ; 526 65 ; 526 67 ; 526 68 ; 526 70 ; 526 71 ; 5263291 ; 5263292 ; 5263297 ;
Abstract

A high quality copolymer of styrene and methyl methacrylate is economically produced by polymerizing styrene and methyl methacrylate in a homogeneous solution of raw materials comprising methyl methacrylate, styrene, and an antioxidant, while the solution of raw materials is continuously supplied to a polymerization reactor including at least one complete-mixing type reaction tank, continuously removing the polymerization product from the polymerization reactor, supplying the polymerization product removed from the polymerization reactor directly to an extruder having a plurality of vents, and extruding a copolymer from the extruder, while volatile matter are removed through the plurality of vents.


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