The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 1999
Filed:
Sep. 25, 1997
Hann-Sheng Huang, Darien, IL (US);
Anthony J Gorski, Woodridge, IL (US);
Abstract
An apparatus and process that utilize a low temperature nonequilibrium plasma reactor, for improving the particulate removal efficiency of an electrostatic precipitator (ESP) are disclosed. A portion of the flue gas, that contains a low level of SO.sub.2 O.sub.2 H.sub.2 O, and particulate matter, is passed through a low temperature plasma reactor, which defines a plasma volume, thereby oxidizing a portion of the SO.sub.2 present in the flue gas into SO.sub.3. An SO.sub.2 rich flue gas is thereby generated. The SO.sub.3 rich flue gas is then returned to the primary flow of the flue gas in the exhaust treatment system prior to the ESP. This allows the SO.sub.3 to react with water to form H.sub.2 SO.sub.4 that is in turn is absorbed by fly ash in the gas stream in order to improve the removal efficiency of the EPS.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile