The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 1999

Filed:

May. 31, 1995
Applicant:
Inventors:

Giuseppe Crisenza, Trezzo sull'Adda, IT;

Cesare Clementi, Busto Arsizio, IT;

Assignee:

STMicroelectronics S.r.l., Agrate Brianza, IT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
257326 ; 257315 ; 257316 ; 257344 ; 257408 ;
Abstract

A non-volatile integrated device having first and second dimensionally different polysilicon gate layers separated by an oxide layer for hot-carrier reliability. More specifically, the oxide and second polysilicon gate layer are selectively etched to form a second gate region over the first polysilicon gate layer that electrically contacts the first polysilicon gate in one direction and is isolated by the oxide in the other direction. Insulating sidewalls are formed over the first polysilicon gate layer regions that are not electrically contacted by the second gate layer to help isolate the second polysilicon gate and form an LDD structure within the substrate for the device.


Find Patent Forward Citations

Crisenza, Giuseppe. (1999). Non-volatile integrated low-doped drain device with partially (U.S. Patent No. 5977586). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5977586

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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