The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1999
Filed:
Mar. 26, 1997
Suk-Bin Han, Chungcheongbuk-do, KR;
LG Semicon Co., Ltd., Chungcheongbuk-do, KR;
Abstract
A semiconductor wafer wet processing device which includes a chamber, a process tank body containing walls and disposed within the chamber, and defining a channel therebetween, at least one of the walls of the process tank body containing a plurality of apertures for providing lateral access between the channel and the interior of the process tank body, a wafer-carrying device disposed within the process tank body, an inlet for introducing a processing liquid into the channel and an outlet for removing the processing liquid from the interior of the process tank body, wherein upon the introduction of the processing liquid through the inlet into the channel, the processing liquid flows over the top of the walls of the process tank body into the interior thereof and laterally through the apertures in the walls of the process tank body for treating the contents thereof and is removed through the outlet.