The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1999
Filed:
May. 16, 1997
Nagao Ogiwara, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A development control method capable of adequately determining exposed frames of a silver halide photosensitive material so as to develop the exposed frames. When a photographing operation is performed by using a predetermined negative film, exposure completion information indicating completion of exposure is recorded at a position corresponding to the position of each frame. When the negative film accommodated in a magazine is drawn out so as to be developed, reading of exposure completion information corresponding to the first frame is tried. If exposure completion information can be read, a determination can be performed that the frame has been exposed. Therefore, reading of exposure completion information corresponding to a next frame is tried. Reading of exposure completion information is sequentially tried for the following frames. When exposure completion information cannot be read, all of the exposed frames are determined to be detected. Thus, the negative film is cut at a boundary between the final exposed frame and a non-exposed region. Only the exposed frames are developed, while the non-exposed region is rewound into the magazine.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile