The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1999
Filed:
Jan. 08, 1998
Piotr Szwaykowski, Tucson, AZ (US);
Michael Greenebaum, Brooklyn, NY (US);
Theodore S Shultz, Larchmont, NY (US);
Electro-Optical Sciences, Inc., Irvington-On-Hudson, NY (US);
Abstract
Common path, two beam interferometers and interferometric measurement systems employ a voltage controlled variable phase retarder enabling rapid stepping of the relative phase between two interfering optical beams by suitable control of the voltage. The beams need not be laterally separated. A compact beam expander with a ball lens is preferably included. The system is compact enough to be contained in a hand-held unit. The system can be used for surface mapping, testing of optical components and detecting the motion of mechanical objects, for example. It is particularly well suited for the mapping of the skin of a live subject. An optimum fringe period and optimum illumination wavelengths for imaging skin are disclosed, enabling the topography of substantial areas of human skin to be rapidly and accurately measured, in times on the order of one-tenth of a second. Methods of conducting interferometric analysis are disclosed, as well.