The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1999
Filed:
Jul. 29, 1998
Charles Spencer Kuivila, LaGrange, KY (US);
David Clay Miller, Madison, IN (US);
Dow Corning Corporation, Midland, MI (US);
Abstract
A method for selecting chemical grade silicon metalloid having improved performance in a direct process for making organohalosilanes. The method comprises (A) heating a chemical grade silicon metalloid sample at a temperature ramp speed controlled to effect a stepwise reduction of oxide impurities present in the chemical grade silicon metalloid to a temperature greater than about 2300.degree. C. in the presence of a carbon source thereby effecting the formation of a reduction product consisting of carbon monoxide and carbon dioxide, (B) determining the amount of the reduction product formed above a temperature of about 1900.degree. C., and (C) selecting a chemical grade silicon metalloid for use in the direct process for making organohalosilanes based upon the amount of the reduction product formed above a temperature of about 1900.degree. C.