The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1999
Filed:
Oct. 08, 1998
Philippe Bescond, Saint Vrain, FR;
Herve Graindorge, Vert le Petit, FR;
Helene Mace, Villebon sur Yvette, FR;
SNPE, Paris, FR;
Abstract
Process for producing the epsilon polymorphic form of hexanitrohexaazaisowurtzitane. According to the process which is the subject-matter of the invention, a saturated solution of hexanitrohexaazaisowurtzitane of any polymorphic form is prepared in a mixture comprising a solvent chosen from esters, nitrites, ethers and ketones, except acetone, and a non-solvent chosen from aliphatic hydrocarbons and aromatic hydrocarbons, the solvent being more volatile than the non-solvent. This saturated solution is subsequently seeded with a few crystals of hexanitrohexaazaisowurtzitane of epsilon polymorphic form and then the mixture is concentrated by evaporation of the solvent. This process is simple, is economical and can be easily extrapolated to the industrial stage. It makes it possible to obtain particle size fractions within the 10 .mu.m-100 .mu.m range with smooth grains with regular facies. Hexanitrohexaazaisowurtzitane, in particular the densest epsilon form, is useful as oxidizing or explosive charge in pyrotechnic compositions.