The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1999
Filed:
Apr. 17, 1998
Applicant:
Inventor:
Dmitry S Starodubov, Los Angeles, CA (US);
Assignee:
D-Star Technologies, Inc., , US;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ;
Abstract
A method of making a phase mask for imposing on light transmitted therethrough an interference pattern. The method comprises various steps including the step of depositing a solidifiable material on a substrate with a first surface relief pattern. The solidifiable material is selected so that the phase mask is at least half as transmissive as it is absorptive of light characterized by a spectral line having a wavelength between 275 and 390 nm. The material is solidified and removed from the substrate so as to yield the phase mask with a second surface relief pattern complementary to the first surface relief pattern.