The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1999
Filed:
Jan. 30, 1998
Applicant:
Inventor:
James L Curtis, Bath, NY (US);
Assignee:
Imaging & Sensing Technology Corporation, Horseheads, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
B32B / ; H01J / ;
U.S. Cl.
CPC ...
428131 ; 428134 ; 428 666 ; 428913 ; 313609 ; 313610 ; 313611 ; 313590 ;
Abstract
An improved baffle (24) for directing the light discharged from a deuterium lamp includes a plate-like member configured as a cylindrical segment (25), an aperture (27) provided through a central portion (26) of the member, and a flattened portion (26) about the aperture. The flattened portion is of such size and has a surface of such reflectivity as to substantially eliminate interference ring(s) of discontinuous light intensity from the light output of the lamp. A deuterium employing the improved baffle affords the advantage of markedly-increased light intensity, as compared with prior art baffles, at selected wavelengths.