The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1999
Filed:
Sep. 02, 1998
William A Givens, Genoa, AK (US);
Geoffrey R Ford, Redfield, AK (US);
Davonna L Ridley, Lockesburg, AK (US);
Keith C Cathey, Texarkana, TX (US);
Arkla, Little Rock, AR (US);
Abstract
A dual pressure gas supply controller system is disclosed which provides apparatus and methods for supplying gas from a gas supply source to one or more gas-burning apparatus requiring two different gas pressure levels. According to the invention, a first gas pressure is supplied the gas-burning apparatus during a first time period, while a second lower gas pressure is supplied to the gas-burning apparatus during a second time period for the purpose of conserving gas. This is accomplished through the use of first and second gas pressure regulators coupled in parallel between the gas supply source and the gas-burning apparatus. A gas pressure control valve is utilized to stop the flow of gas from the first gas pressure regulator and enable the flow of gas from the second gas pressure regulator during the second time period. The gas pressure control valve can also be used to enable the flow of gas from the first gas pressure regulator and reduce the flow of gas from the second gas pressure regulator during the first time period. The gas pressure control valve can be controlled by an electrical circuit, such as a PLC to provide maximum automated performance.