The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1999
Filed:
Jul. 30, 1997
Fumio Mogi, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method for determining a state of a processing solution in a printer processor which exposes a photosensitive material to a light emitted from a light source and processes the material with processing solution, the printer processor having a function to correct exposure conditions in response to at least the amount of light from the light source, a characteristic of the photosensitive material, and a state of the processing solution by adjusting a plurality of exposure condition correction parameter values, comprising the steps of: (a) storing change history of at least one of the exposure condition correction parameter values; and (b) determining whether or not the state of the processing solution is in a preferable state based on the stored change history of at least one of the correction parameter values. Therefore, the characteristics of the change in the processing solution state appear in the history of change of the exposure condition correction parameter values. In other words, the processing solution can be determined whether or not it is in a preferable state based on the history of change of the correction parameter values.