The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 1999

Filed:

Sep. 19, 1997
Applicant:
Inventors:

Jammy Chin-Ming Huang, Taipei, TW;

David Nan-Chou Liu, Fong-Yuani, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
313495 ; 313309 ;
Abstract

A two-part field emission structure, and a method for making such a structure, is described. A substrate is provided having a first conductive layer thereon, a first insulating layer over the first conductive layer, a second conductive layer over the first insulating layer, and an opening formed in the first insulating and second conductive layers. A sacrificial layer is formed over the second conductive layer. A bottom portion of the field emitter structure is formed in the opening, by vertical deposition of a conductive material, whereby a third conductive layer, having a collimated channel over the bottom portion, is formed over the sacrificial layer. The formation of the field emitter structure is completed by vertical deposition of a tip material on to the top of the bottom portion of the field emitter structure, whereby a top conductive layer is formed over the third conductive layer. Lastly, the sacrificial layer, the third conductive layer, and the top conductive layer are removed. An optional interface adhesion layer is formed between the bottom portion of the field emitter structure and the tip.


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