The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1999
Filed:
Nov. 23, 1994
William G Hawkins, Webster, NY (US);
Cathie J Burke, Rochester, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
A high voltage MOS transistor, for use in a thermal ink jet printhead, is fabricated with a single, uniformly thick layer of polysilicon that serves as a field plate over the drift region and a gate over the channel region. The fabrication of the drift region and associated drift oxide is performed in a sequence independent of the device channel stop and field oxide fabrication, allowing the drift region to be optimized by varying the thickness of the drift oxide. Using a field plate to increase the breakdown voltage of the device by reducing the concentration of the electric field, the device transconductance is increased by increasing the doping of the drift region without an attendant decrease in breakdown voltage.