The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1999
Filed:
Apr. 07, 1998
Hiroshi Ando, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of processing electron emitting devices for electron beam sources, wherein the electrons emitted from the electron beam source have an axial symmetric distribution of emitted electrons include determining a crystal axis direction of the crystal bar used as the material for the electron beam source, and cutting out chip material in such a manner that the longitudinal direction of the axis of the electron emitting device coincides with the crystal axis direction of the crystal bar. As a result, the emitted electrons becomes symmetrical to the axial direction, forming an axially symmetrical distribution, and a uniform electron irradiation on a specimen can be achieved in electron microscopes, electron beam inspection and measuring apparatus, electron lithography systems, and the like.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile