The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 1999
Filed:
Jul. 13, 1998
Applicant:
Inventors:
Kiyotaka Mashita, Hitachi, JP;
Atsushi Fujioka, Hitachi, JP;
Takayuki Saitoh, Hitachi, JP;
Akihiro Kobayashi, Ichihara, JP;
Fumiaki Kanega, Ichihara, JP;
Assignee:
Hitachi Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K / ; C07C / ; C08F / ;
U.S. Cl.
CPC ...
25218218 ; 2523635 ; 585435 ; 5253333 ;
Abstract
A method for preparing a trimer of .alpha.-methyl styrene or derivatives thereof, wherein .alpha.-methyl styrene or derivatives thereof is added to an organic solvent comprising Lewis acid is provided. According to the method, the trimer of .alpha.-methyl styrene or derivatives thereof can be obtained in high yield.
Mashita, Kiyotaka. (1999). Method for preparing trimer of .alpha.-methyl styrene or derivatives (U.S. Patent No. 5968409). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5968409
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile