The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1999
Filed:
Mar. 27, 1997
Applicant:
Inventors:
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
524547 ; 1014501 ; 106-2 ; 524376 ; 524386 ; 524544 ; 526248 ; 526276 ; 526278 ;
Abstract
A desensitizing solution for lithography is disclosed which contains at least one member selected from acyclic amine and ammonium compounds each containing specific structures. The desensitizing solution does not cause environmental pollution, is stable to long-term storage, continuous use, and fluctuations in environmental conditions, is effective in reducing the time required for etching treatment, and has excellent desensitization performance.
Kasai, Seishi. (1999). Desensitizing solution for lithography (U.S. Patent No. 5965660). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5965660
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile