The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 1999

Filed:

Apr. 11, 1997
Applicant:
Inventors:

Hyung Jin Jung, Seoul, KR;

Seok Keun Koh, Seoul, KR;

Won Kook Choi, Seoul, KR;

Kyong Sop Han, Seoul, KR;

Sik Sang Gam, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J / ; C08J / ; C08F / ; C09J / ;
U.S. Cl.
CPC ...
522-1 ; 522-2 ; 522-3 ; 522148 ; 522153 ; 522154 ; 522161 ; 522162 ; 522163 ; 522164 ; 1562722 ; 20419234 ; 20419236 ; 20419237 ; 20415715 ;
Abstract

A process for modifying the surfaces of a polymer, ceramic, ITO or glass by irradiating energized ion particles onto the surfaces of the polymer, ceramic, ITO or glass, while blowing a reactive gas directly over the surface of the polymer, ceramic, ITO or glass under a vacuum condition, to decrease the wetting angle of the surface. The process can be widely used in the fields of polymers because it provides effects of increasing the spreading of aqueous dyestuffs, increasing adhesive strength with other materials and inhibition of light scattering by decreasing the wetting angle of the material surface.


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