The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1999
Filed:
Nov. 28, 1997
Applicant:
Inventors:
Hiroshi Kuboya, Tokyo, JP;
Toshiharu Takahashi, Yamagata-ken, JP;
Makoto Iki, Tokyo, JP;
Moriyasu Shirayanagi, Tokyo, JP;
Koichi Maruyama, Tokyo, JP;
Teruaki Hiyamuta, Tokyo, JP;
Takayuki Sensui, Tokyo, JP;
Assignee:
Asahi Kogaku Kogyo Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430312 ; 430394 ; 430396 ;
Abstract
A diffusion plate includes a plurality of superimposed basic patterns, each having a large number of microstructures, wherein the microstructures are located in two dimensional periodic arrangements, and wherein lattice vectors, corresponding to the periodic arrangement of the microstructures, vary in accordance with the pattern. The invention also discloses a method for manufacturing a master die for such a diffusion plate, and a focusing screen using the diffusion plate.