The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1999
Filed:
Jul. 19, 1996
Yeau-Kuen Fang, Tainan, TW;
Kuen-Hsien Lee, Taichung, TW;
National Science Council, Taipei, TW;
Abstract
An amorphous-silicone-based antifuse structure has been invented for VLSI (Very Large Scale Integration circuits) FPGA's (Fields Programmable Gate Array) applications. The structure comprises from top to bottom a first Al layer/a first i-a-SiC:H layer/an i-a-SiH layer/a second i-a-SiC:H layer/a second Al layer, which is basically a MIM (Metal/Insulator/Metal) structure. The MIM structure offers such major advantages as simple for preparation and low in cost. Due to use of the Al layer as an electrode metal and use of a PECVD system for the preparation of the amorphous silicon materials, the antifuse structure is compatible with that of general VLSI devices. In addition, due to a difference in the thickness of barrier enhancement layers in the first and the second i-a-SiC:H layer, a programmed voltage can be adjusted easily and applied in many fields. This structure has a very low on-resistance as the antifuse structure breakdown. The anitifuse has a high resistance (i.e. OFF state) under an unprogrammable state and its leakage current under 5V bias is smaller than 100 nA.