The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 1999
Filed:
Jul. 15, 1997
Abstract
In an apparatus and method for forming an applied layer of a photosensitive resin on a large glass substrate for an LCD color filter, a substrate (S) is suctioned and held by a movable holder (8) with a main surface thereof to be processed oriented downward. The movable holder (8) is at an angle of inclination (.theta.) to the horizontal and is capable of moving along a guide rail (7). An application head (H) having an upward-pointing linear slit (13) through which an application liquid is supplied is provided below a region through which the substrate (S) moves supported by the holder (8). When the substrate (S) having a constant clearance (I.sub.2) with the application head (H) is moved diagonally upward, an application liquid bead (B) is formed between the slit (13) and the downward-pointing main surface of the substrate (S), by surface tension. The application liquid bead (B) is moved gradually diagonally downward along the main surface of the substrate to form an application layer (Ra). A meniscus (L.sub.2) of the application liquid bead (B) facing the higher side of the substrate (S) has a height dimension (h.sub.2) that is greater than that of a meniscus (L.sub.1) thereof facing the lower side of the substrate, and the height dimension of the meniscus on the higher side of the substrate (S) is made to be sufficiently larger than the thickness of the application liquid layer. This suppresses the generation of shear forces caused by differences in tension force within the application liquid bead (B) created by unevenness in the substrate surface, and thus a uniform applied layer can be formed stably and at a high usage efficiency of application liquid, without being affected by unevenness in the main surface of the substrate.