The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 1999

Filed:

Mar. 21, 1997
Applicant:
Inventors:

Naohiro Sugiyama, Nagoya, JP;

Atsuto Okamoto, Nagoya, JP;

Toshihiko Tani, Nagoya, JP;

Nobuo Kamiya, Nisshin, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B / ;
U.S. Cl.
CPC ...
117107 ; 117-2 ; 117902 ; 117935 ; 117951 ; 438931 ;
Abstract

An easy and low-cost method of producing a large-size and high-purity silicon carbide (SiC) single crystal includes reacting silicon vapor directly with a carbon-containing compound gas under a heated atmosphere (growth space 14) to grow a silicon carbide single crystal (15) on a silicon carbide seed crystal (12), in which the silicon vapor generated from molten silicon (13) is used as a silicon vapor source, and a hydrocarbon gas (9) (e.g., propane gas) is used as the carbon-containing compound gas.


Find Patent Forward Citations

Sugiyama, Naohiro. (1999). Method of producing silicon carbide single crystal (U.S. Patent No. 5964944). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5964944

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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