The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 1999
Filed:
Nov. 27, 1995
Applicant:
Inventors:
M Dalil Rahman, Flemington, NJ (US);
Daniel P Aubin, Voluntown, CT (US);
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; C02F / ;
U.S. Cl.
CPC ...
4302701 ; 430168 ; 528482 ; 210660 ; 210681 ; 210682 ;
Abstract
The present invention provides methods for producing a photoresist having a very low level of metal ions, utilizing a treated chelating ion exchange resins to make the neutral ammonium salt or acid form. A method is also provided for producing semiconductor devices using such photoresist compositions.
Rahman, M. (1999). Metal ion reduction in photoresist compositions by chelating ion (U.S. Patent No. 5962183). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5962183
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile