The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 1999

Filed:

Apr. 25, 1997
Applicant:
Inventors:

Jian Jiang, Akiruno, JP;

Masahisa Kosaka, Akiruno, JP;

Assignee:

Hoya Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
252582 ; 252587 ; 252589 ; 528 85 ; 528377 ;
Abstract

A process for producing a polythiol oligomer having disulfide linkages by reacting polythiol (with the functionality of two or above) with sulfur in a molar ratio of m to (m-1) (where m is an integer of 2 to 21) in the presence of a basic catalyst, whereby the oligomers produced have a degree of oligomerization of m (wherein m is defined as above). Specifically disclosed is a process for reacting 2,5-dimercaptomethyl-1,4-dithiane (DMMD) with sulfur in a molar ratio 2:1 or 3:2 in the presence of a basic catalyst, thereby producing an oligomer represented by the below formula: ##STR1## (wherein n is an integer of up to 21). Also disclosed are optical polymers made with the oligomer and optical materials and devices made with the polymer.


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