The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 1999
Filed:
Dec. 18, 1996
Applicant:
Inventor:
Koichiro Akari, Takasago, JP;
Assignee:
Kabushiki Kaisha Kobe Seiko Sho, Kobe, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-11 ; 134-1 ; 427540 ; 427547 ; 427585 ; 427598 ;
Abstract
A vacuum arc evaporation method of disposing a vacuum arc evaporation source and a substrate in a vacuum chamber, and introducing ions generated by arc discharge on the surface of the vacuum arc evaporation source to the substrate by means of magnetic fields, thereby forming a film, wherein the substrate is cleaned before forming the film by generating the arc disc while supplying a gas mixture of a nitrogen gas and an argon gas, a xenon gas, or a gas mixture of nitrogen gas and a xenon gas in the vacuum chamber. A film with improved adhesion and surface roughness can be obtained.