The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1999
Filed:
Apr. 21, 1997
Koichi Shinoda, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
The invention provides a standard pattern production system which produces an optimum recognition unit in terms of an information criterion to given learning data using an information criterion in learning of a standard pattern in pattern recognition. An input pattern production section holds an input pattern, and a standard pattern producing parameter production section calculates and outputs parameters necessary to produce standard patterns of individual categories. A cluster set production section divides a category set into cluster sets. A common standard pattern production section calculates standard patterns of individual clusters of the cluster sets. An optimum cluster selection section receives a plurality of cluster sets and common standard patterns and selects an optimum cluster using an information criterion. A standard pattern storage section stores the common standard pattern of the optimum cluster set as a standard pattern for the individual categories.