The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1999
Filed:
May. 18, 1998
Applicant:
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
2504922 ; 378 34 ;
Abstract
An exposure apparatus for transferring a pattern, formed on a membrane of a mask, to an exposure region of a wafer disposed opposed to the mask with a small spacing kept therebetween. The apparatus includes an exposure system for transferring, by exposure, the pattern of the mask to different exposure regions of the wafer sequentially, a measuring system for producing deformation information related to at least one portion of the mask membrane, and an attitude controlling system for controlling attitude of at least one of the mask and the wafer, on the basis of the deformation information produced by the measuring system.