The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1999
Filed:
Jul. 08, 1997
I-Fan Wang, San Diego, CA (US);
Jerome F Ditter, Santa Ana, CA (US);
Richard A Morris, Encinitas, CA (US);
Robert Kesting, Sumner, WA (US);
USF Filtration and Separations Group, Inc., Timonium, MD (US);
Abstract
The present invention relates to highly asymmetric polymer membranes for ultrafiltration (UF), and to a simplified method of their manufacture. Disclosed herein are UF membranes with a high degree of asymmetry between the size of pores at the skin face of the membrane and the size of pores at the opposite face of the membrane. Asymmetry ratios of these membranes range from about 20 to about 1000. The porous support layer between the skin face and the opposite face is reticular and is substantially free of macrovoids. These membranes thus have higher flow rates than prior UF membranes. The membranes are cast from polymer dope mixes that are either homogeneous solutions or stable colloidal dispersions.