The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1999
Filed:
Oct. 23, 1996
Applicant:
Inventors:
Assignee:
Ricoh Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B41M / ; B41M / ;
U.S. Cl.
CPC ...
503227 ; 428195 ; 4284231 ; 428447 ; 4284744 ; 4284884 ; 428913 ; 428914 ;
Abstract
A sublimation thermal transfer recording material including a smooth and excellent heat resistant layer which has excellent feeding property and excellent image qualities even when used for n-fold speed mode multiple sublimation thermal transfer recording. The sublimation thermal transfer recording material comprises a substrate, an ink layer formed thereon and a heat resistant layer formed on the non-layered side of the substrate, wherein the heat resistant layer has a softening point of at least 200.degree. C. which is measured by a method based on JIS-K7196.
Quick Actions:
Uemura, Hiroyuki. (1999). Sublimation thermal transfer recording method and recording material (U.S. Patent No. 5958832). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5958832
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