The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 1999

Filed:

Nov. 06, 1997
Applicant:
Inventor:

Donald Lee Brown, Livermore, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F / ;
U.S. Cl.
CPC ...
266176 ; 266202 ; 21912135 ; 425-6 ;
Abstract

A method and apparatus for producing nanoparticles at a high rate is provided. The system uses two chambers separated by a narrow duct. Contained within the lower chamber is the source material, preferably heated with an electron gun and fed with a continuous feeder for extended nanoparticle production runs. The upper chamber is used to nucleate the nanoparticles, the nanoparticles formed when the source vapor collides with a gas contained within the upper chamber. Depending upon the desired nanoparticles, the gas within the upper chamber is either inert or reactive. The duct connecting the upper and lower chambers is narrow enough to allow differential pumping of the chambers. Furthermore the vapor stream flowing though the duct at high speed provides a pumping action which helps to maintain the differential pressures within the two chambers. At least a portion of the top surface of the upper chamber is cooled, thus providing a condensation site for the nanoparticles. Periodically one or more scrappers remove the condensed nanoparticles from the condensation surface, allowing them to collect within particle collection containers surrounding the duct.


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