The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 1999
Filed:
Apr. 17, 1997
Jon Cardenas, Austin, TX (US);
Alexander P Plevich, Austin, TX (US);
Timothy C Kinsey, Austin, TX (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A slurry distribution system for distributing slurry to a polishing machine that polishes a semiconductor wafer is disclosed. The slurry distribution system includes a storage tank for storing the slurry, a mixing device for mixing the slurry in the storage tank, a distribution loop with an inlet and outlet in fluid communication with the storage tank, a valve in fluid communication with the distribution loop for dispensing the slurry to the polishing machine, and a pump for circulating the slurry from the storage tank through the distribution loop and into the storage tank regardless of whether the slurry is dispensed to the polishing machine. In this manner, the slurry is agitated and efficiently used during polishing and during intervals between polishing.